Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Applied Surface Science

Volumn 259, Issue , 2012, Pages 448-453

  Tang, Xiufeng ^a   Luo, Fa ^a   Ou, Fang ^b   Zhou, Wancheng ^a   Zhu, Dongmei ^a   Huang, Zhibin ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b Northwestern University   (United States)

Author keywords

Annealing; DC reactive magnetron sputtering; Heat treatment

Indexed keywords

ALUMINA; ALUMINUM ALLOYS; ALUMINUM COATINGS; ALUMINUM OXIDE; AMORPHOUS FILMS; ANNEALING; BIAS VOLTAGE; DEPOSITION RATES; GRAIN REFINEMENT; HEAT TREATMENT; MAGNETRON SPUTTERING; MICROHARDNESS; NICKEL ALLOYS; NICKEL COMPOUNDS; SUBSTRATES; THIN FILMS;

ALUMINUM OXIDE THIN FILMS; APPLICATION ENVIRONMENT; DC REACTIVE MAGNETRON SPUTTERING; ELEMENTAL COMPOSITIONS; NEGATIVE SUBSTRATES; NI-BASED SUPERALLOYS; POST DEPOSITION ANNEALING; STRUCTURE AND PROPERTIES;

OXIDE FILMS;

EID: 84866014304     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.07.064     Document Type: Article

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