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Volumn 122, Issue 2-3, 1999, Pages 202-207

Reactive d.c. magnetron sputter deposited Al2O3 films: Large-area coatings for industrial applications

Author keywords

Al2O3; Large area coatings; Reactive d.c. magnetron sputtering

Indexed keywords

COATING; DEPOSITION; SPUTTERING; STABILITY;

EID: 0012812949     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00378-3     Document Type: Article
Times cited : (21)

References (16)
  • 7
    • 0342416903 scopus 로고
    • Ph.D. thesis, Aachen University (D82 [Diss. RWTH Aachen] ISBN 3-89653-502-1
    • M. Arntzen, Ph.D. thesis, Aachen University (D82 [Diss. RWTH Aachen] 1991, ISBN 3-89653-502-1.
    • (1991)
    • Arntzen, M.1
  • 10
    • 0343286487 scopus 로고
    • R. Behrisch, Wittmaack W. Berlin: Springer
    • Hofer W.O. Behrisch R., Wittmaack W. Topics in Applied Physics. Vol. 64:1991;54 Springer, Berlin.
    • (1991) Topics in Applied Physics , vol.64 , pp. 54
    • Hofer, W.O.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.