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Applied Surface Science

Volumn 136, Issue 1-2, 1998, Pages 137-146

Atomic layer epitaxy of copper: An ab initio investigation of the CuCl/H 2 process I. Adsorption of CuCl on Cu(111)

(3) Mårtensson, Per a Larsson, Karin a Carlsson, Jan Otto a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

Adsorption; Copper; Copper(I)chloride; Density functional calculations

Indexed keywords

ADSORPTION; COMPUTATIONAL METHODS; COPPER COMPOUNDS; CRYSTAL ORIENTATION; DIMERS; DISSOCIATION; EPITAXIAL GROWTH; HYDROGEN; SURFACE PHENOMENA;

ATOMIC LAYER EPITAXY; COPPER CHLORIDE; DENSITY FUNCTIONAL THEORY (DFT);

COPPER;

EID: 0042357582 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00330-4 Document Type: Article

Times cited : (16)

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