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Volumn 3, Issue 6, 2011, Pages 932-938

Characterization of ruthenium thin film on tantalum by electrochemical deposition: Rutherford backscattering spectroscopy

Author keywords

Barrier layer; Copper; Electrochemical deposition; Ruthenium; Rutherford backscattering spectrometry

Indexed keywords


EID: 84864841901     PISSN: 19472935     EISSN: 19472943     Source Type: Journal    
DOI: 10.1166/sam.2011.1220     Document Type: Article
Times cited : (3)

References (35)
  • 26
    • 84864861810 scopus 로고
    • Handbook of X-Ray Photoelectron Spectroscopy, Physical Electronics, Inc., Eden Praire, MN
    • J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy, Physical Electronics, Inc., Eden Praire, MN (1992).
    • (1992)
    • Moulder, J.F.1    Stickle, W.F.2    Sobol, P.E.3    Bomben, K.D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.