Ruthenium electrodeposition on silicon from a room-temperature ionic liquid

Electrochimica Acta

Volumn 54, Issue 25, 2009, Pages 6042-6045

  Raz, Ofer ^a   Cohn, Gil ^a   Freyland, Werner ^b   Mann, Olivier ^b   Ein Eli, Yair ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Electrodeposition; Ionic liquids; Ruthenium

Indexed keywords

ELECTROCHEMICAL DEPOSITION; HEXAFLUOROPHOSPHATES; IMIDAZOLIUM; N TYPE SILICON; ROOM TEMPERATURE IONIC LIQUIDS; RU FILM; RUTHENIUM CHLORIDES; SEM;

CHLORINE COMPOUNDS; CYCLIC VOLTAMMETRY; DISSOLUTION; ELECTRODEPOSITION; IONIZATION OF LIQUIDS; IONS; PLATINUM; REDUCTION; RUTHENIUM; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; STRIPPING (DYES); X RAY PHOTOELECTRON SPECTROSCOPY;

IONIC LIQUIDS;

EID: 69249131730     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.01.012     Document Type: Article

References (25)

1. Wasserscheid P., and Welton T. Ionic Liquids in Synthesis (2003), Wiley-VCH
2. Ohno H. Electrochemical Aspects of Ionic Liquids (2005), Wiley-Interscience
3. Hagiwara R., and Ito Y. J. Fluorine Chem. 105 (2000) 221
4. Freyland W., Zell C.A., Zein El Abedin S., and Endres F. Electrochim. Acta 48 (2003) 3053
5. Dogel J., and Freyland W. Phys. Chem. Chem. Phys. 5 (2003) 2484
6. Tai C.C., Su F.Y., and Sun I.W. Electrochim. Acta 50 (2005) 5504
7. Mukhopadhyay I., and Freyland W. Chem. Phys. Lett. 377 (2003) 223
8. In: Endres F., McFarlene D., and Abbott A. (Eds). Electrodeposition from Ionic Liquids (2008), Wiley-VCH, Weinheim
9. Green M.L., Gross M.E., Papa L.E., Schomes K.J., and Barsen D. J. Electrochem. Soc. 182 (1985) 2677
10. Crown A., and Wieckowski A. Phys. Chem. Chem. Phys. 3 (2001) 3290
11. Aatonen T., Rahti A., Ritala M., and Leskela M. Electrochem. Solid State Lett. 6 9 (2003) C130
12. Aatonen T., Alen P., Ritala M., and Leskela M. Chem. Vap. Dep. 9 1 (2003) 45
13. Aatonen T., Ritala M., Arstilsa K., Keinonen J., and Leskela M. Chem. Vap. Dep. 10 4 (2004) 215
14. In: Jones T. (Ed). Electrodeposition & Electroless Deposition of the Precious Metals: Rhodium, Ruthenium, Iridium, Osmium, Rhenium (2003), Finishing Publications Limited
15. Jones T. Metal Finishing 99 6 (2001) 121
16. Zhang Y., Huang L., Arunagiri T.N., Ojeda O., Flores S., Chyan O., and Wallace R.M. Electrochem. Solid-State Lett. 7 9 (2004) C107
17. Murarka S.P. In: Gupta D. (Ed). Diffusion Processes in Advanced Technological Materials (2005), Springer-Verlag Berlin and Heidelberg GmbH & Co. K 239
18. Hwang C.S. Mater. Sci. Eng. B56 (1998) 178
19. Bondaru J., Sands T., and Tsakalakos L. J. Appl. Phys. 84 2 (1998) 1121
20. Hu C.C., and Huang Y.H. J. Electrochem. Soc. 146 7 (1999) 2465
21. Molenda E., and Mielcarski M. J. Radioanal. Nucl. Chem. 238 (1998) 159
22. Mann O., Freyland W., Raz O., and Ein-Eli Y. Chem. Phys. Lett. 460 (2008) 178
23. Mann O., and Freyland W. J. Phys. Chem. C 111 (2007) 9832
24. Gunawardena G., Hills G., Montenegro I., and Scharifker B. J. Electroanal. Chem. 138 (1982) 225
25. Chan H.Y.H., Takoudis C.G., and Weaver M.J. J. Catal. 172 (1997) 336