Thickness induced metal-nonmetal transition in ultrathin electrodeposited Ge films

Chemical Physics Letters

Volumn 377, Issue 1-2, 2003, Pages 223-228

  Mukhopadhyay, I ^a   Freyland, W ^a  

^a UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

1 BUTYL 3 METHYLIMIDAZOLIUM HEXAFLUOROPHOSPHATE; GERMANIUM; PHOSPHATE; SILICON; UNCLASSIFIED DRUG;

ARTICLE; ELECTROCHEMISTRY; FILM; IONIZATION; QUALITATIVE ANALYSIS; ROOM TEMPERATURE; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR; SPECTROSCOPY; SYNTHESIS; TOPOGRAPHY;

EID: 0141562069     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(03)01098-4     Document Type: Article

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