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Volumn 205, Issue 5, 2010, Pages 1362-1367
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Annealing and oxidation study of Ta-Ru hard coatings
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Author keywords
Glass molding; Intermetallic compounds; Oxidation; Ta Ru
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Indexed keywords
ANNEALING IN VACUUM;
ANNEALING TREATMENTS;
CEMENTED CARBIDE SUBSTRATES;
CHEMICAL COMPOSITIONS;
DEPOSITED COATINGS;
DIRECT-CURRENT MAGNETRONS;
GLASS MOLDING;
GRAIN SIZE;
HIGH-TEMPERATURE ENVIRONMENT;
INTERMETALLIC COMPOUNDS;
LAMINATED STRUCTURES;
MASS PRODUCTION;
OPTICAL COMPONENTS;
PREFERENTIAL OXIDATION;
REFRACTORY METAL ALLOYS;
TA-RU;
VACUUM LEVEL;
ANNEALING;
AUGER ELECTRON SPECTROSCOPY;
CHROMATE COATINGS;
CHROMIUM;
GLASS;
GRAIN GROWTH;
GRAIN SIZE AND SHAPE;
HARDNESS;
INTERMETALLICS;
INTERNAL OXIDATION;
MAGNETRONS;
METAL MOLDING;
PHASE STABILITY;
PROTECTIVE COATINGS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
TANTALUM;
TANTALUM CARBIDE;
TRANSMISSION ELECTRON MICROSCOPY;
VACUUM;
X RAY PHOTOELECTRON SPECTROSCOPY;
HARD COATINGS;
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EID: 78649949898
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2010.08.041 Document Type: Article |
Times cited : (19)
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References (36)
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