Improved diffusion barrier performance of Ru/TaN bilayer by N effusion in TaN underlayer

Materials Chemistry and Physics

Volumn 135, Issue 2-3, 2012, Pages 806-809

  Wang, L ^a   Cao, Z H ^a   Hu, K ^a   She, Q W ^a   Meng, X K ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

Diffusion barrier; Interface diffusion; Microstucture; RuN

Indexed keywords

BARRIER PERFORMANCE; BARRIER PROPERTIES; BI-LAYER; INTERFACE DIFFUSION; MICROSTUCTURE; RUN; UNDERLAYERS;

DIFFUSION BARRIERS; GRAIN BOUNDARIES;

TANTALUM COMPOUNDS;

EID: 84864682340     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.05.061     Document Type: Article

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