Electric field accelerating interface diffusion in CuRuTaNSi stacks during annealing

Electrochemical and Solid-State Letters

Volumn 15, Issue 6, 2012, Pages

  Wang, L ^a   Cao, Z H ^a   Syed, J A ^a   Hu, K ^a   She, Q W ^a   Meng, X K ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATING EFFECT; ATOM DIFFUSION; ELECTRIC FIELD ANNEALING; EXTERNAL ELECTRIC FIELD; INTERFACE DIFFUSION;

ELECTRIC FIELDS; TANTALUM COMPOUNDS;

DIFFUSION;

EID: 84860451485     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.023206esl     Document Type: Article

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