Iron-assisted ion beam patterning of Si(001) in the crystalline regime

New Journal of Physics

Volumn 14, Issue , 2012, Pages

  Macko, Sven ^a   Grenzer, Jörg ^b   Frost, Frank ^c   Engler, Martin ^a   Hirsch, Dietmar ^c   Fritzsche, Monika ^b   Mücklich, Arndt ^b   Michely, Thomas ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; CODEPOSITION; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH ASPECT RATIO; IDENTICAL CONDITIONS; ION BEAM EROSION; ION BEAM PATTERNING; ION FLUENCES; IRON SILICIDES; PATTERN FORMATION; POLYCRYSTALLINE; SI(0 0 1);

AMORPHOUS MATERIALS; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ION BOMBARDMENT; IRON; PHASE SEPARATION; SCANNING ELECTRON MICROSCOPY; SILICIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SILICON;

EID: 84864340458     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/14/7/073003     Document Type: Article

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