Multiple scattering causes the low energy-low angle constant wavelength topographical instability of argon ion bombarded silicon surfaces

Applied Surface Science

Volumn 258, Issue 9, 2012, Pages 4112-4115

  Madi, Charbel S ^a   Aziz, Michael J ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Nanoscale morphology evolution; Sputtering

Indexed keywords

ARGON; ION BEAMS; IONS; MULTIPLE SCATTERING; PHASE DIAGRAMS; SILICON; SPUTTERING;

INCIDENCE ANGLES; NANOSCALE MORPHOLOGY; NORMAL INCIDENCE; SCATTERING EFFECTS; SILICON SURFACES; SILICON TARGETS; STABLE SURFACES; SURFACE DYNAMICS;

SURFACE SCATTERING;

EID: 84857049820     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.07.143     Document Type: Conference Paper

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