Plasma diagnostics of an Ar/NH 3 direct-current reactive magnetron sputtering discharge for SiN x deposition

Thin Solid Films

Volumn 520, Issue 20, 2012, Pages 6386-6392

  Henry, F ^a   Duluard, C Y ^a   Batan, A ^a   Reniers, F ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

Optical emission spectroscopy; Plasma magnetron; Silicon nitride; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL STATE; CONTINUOUS TRANSITIONS; DC REACTIVE MAGNETRON SPUTTERING; DIRECT-CURRENT; GASPHASE; MOLAR FRACTIONS; REACTIVE MAGNETRON SPUTTERING; SILICON NITRIDE THIN FILMS; SILICON TARGETS; SPUTTERING PROCESS; TARGET SURFACE; XPS MEASUREMENTS;

DEPOSITION; EMISSION SPECTROSCOPY; LIGHT EMISSION; MAGNETRON SPUTTERING; OPTICAL EMISSION SPECTROSCOPY; PHOTOELECTRONS; PLASMA DIAGNOSTICS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON NITRIDE;

EID: 84863982316     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.06.048     Document Type: Article

References (33)

1. G. Santana, and A. Morales-Acevedo Sol. Energy Mater. Sol. Cells 60 2000 135
2. V.M. Bermudez, and F.K. Perkins Appl. Surf. Sci. 235 2004 406
3. Y. Hirohata, N. Shimamoto, T. Hino, T. Yamashima, and K. Yabe Thin Solid Films 253 1994 425
4. Y. Kuo, and H.H. Lee Vacuum 66 2002 299
5. M. Orfert, and K. Richter Surf. Coat. Technol. 116-119 1999 622
6. A. Batan, A. Franquet, J. Vereecken, and F. Reniers Surf. Interface Anal. 40 2008 754
7. S. Berg, and T. Nyberg Thin Solid Films 476 2005 215
8. S. Berg, H.O. Blom, T. Larsson, and C. Nender J. Vac. Sci. Technol., A 5 1987 202
9. D. Depla, and R. De Gryse Surf. Coat. Technol. 183 2004 190
10. M. Vila, J.A. Martin-Gago, A. Muñoz-Martin, C. Prieto, P. Miranzo, M.I. Osendi, J. Garcia-López, and M.A. Respaldiza Vacuum 67 2002 513
11. C.C. Johnson, T. Wydeven, and K. Donohoe Sol. Energy 31 1983 355
12. A. Kolodziej J. Non-Cryst. Solids 185 1995 168
13. D. Depla, S. Mahieu, and R. De Gryse Thin Solid Films 517 2009 2825
14. D. Depla, S. Heirwegh, S. Mahieu, J. Haemers, and R. De Gryse J. Appl. Phys. 101 2007 013301
15. F. Perry, B. Stauder, G. Henrion, and P. Pigeat Surf. Coat. Technol. 74-75 1995 575
16. H. Kakati, A.R. Pal, H. Bailung, and J. Chutia J. Appl. Phys. 101 2007 083304
17. Yu Ralchenko, A. Kramida, J. Reader NIST ASD Team NIST Atomic Spectra Database (version 4.1) 2011 [Online]. Available: http://physics.nist.gov/asd National Institute of Standards and Technology, Gaithersburg, MD.
18. C. Lejeune Interactions plasmas froids-surfaces, Edition de physique 1988
19. V.M. Donnelly J. Phys. D: Appl. Phys. 37 2004 R217
20. J.A. Thornton J. Vac. Sci. Technol. 15 1978 171
21. D. Depla, G. Buyle, J. Haemers, and R. De Gryse Surf. Coat. Technol. 200 2006 4329
22. M.A. Lieberman Principles of Plasma Discharges and Materials Processing 2005 John Wiley and Sons
23. M.P. Seah, and W.A. Dench Surf. Interface Anal. 1 1979 2
24. C. Maillot, H. Roulet, and G. Dufour J. Vac. Sci. Technol., B 2 1984 316
25. L. Kubler, J.L. Bischoff, and D. Bolmont Phys. Rev. B: Condens. Matter 38 1988 13113
26. A. Okamoto, and T. Serikawa Thin Solid Films 137 1986 143
27. R. d'Agostino, F. Cramarossa, S. Benedictis, and G. Ferraro Plasma Chem. Plasma Process. 1 1981 19
28. Z.L. Cai, J.M.L. Martin, and J.P. François J. Mol. Spectrosc. 188 1998 27
29. B. Kulakowska-Pawlak, W. Zyrnicki, K. Miernik, and J. Walkowicz Surf. Coat. Technol. 116-119 1999 1076
30. R. Walkup, P. Avouris, R.W. Dreyfus, J.M. Jasinski, and G.S. Selwyn Appl. Phys. Lett. 45 1984 372
31. G. Zambrano, H. Riascos, P. Prieto, E. Restrepo, A. Devia, and C. Rincûn Surf. Coat. Technol. 172 2003 144
32. N.A. Sanchez, C. RincÛn, G. Zambrano, H. Galindo, and P. Prieto Thin Solid Films 373 2000 247
33. S.M. Rossnagel, and K.L. Saenger J. Vac. Sci. Technol., A 7 1989 968