Effect of oxygen on the characteristics of radio frequency planar magnetron sputtering plasma used for aluminum oxide deposition

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Kakati, H ^a   Pal, A R ^a   Bailung, H ^a   Chutia, Joyanti ^a  

^a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; DEPOSITION; ELECTRIC DISCHARGES; LEAST SQUARES APPROXIMATIONS; MAGNETRON SPUTTERING; OPTICAL EMISSION SPECTROSCOPY;

ALUMINUM OXIDE DEPOSITION; NONREACTIVE MODES; RADIO FREQUENCY PLANAR MAGNETRON SPUTTERING PLASMA;

ELECTRON TEMPERATURE;

EID: 34247601668     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2718864     Document Type: Conference Paper

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