Plasma enhanced chemical vapor deposition of SiN-films for passivation of three-dimensional substrates

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 622-628

  Orfert, M ^a   Richter, K ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Coating; Passivation; PECVD; Silicon nitride; Three dimensional substrates

Indexed keywords

AMMONIA; ARGON; ELECTRON CYCLOTRON RESONANCE; ETCHING; NITROGEN; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; REFRACTIVE INDEX; SILANES; SILICON NITRIDE; THERMAL EFFECTS;

THREE DIMENSIONAL SUBSTRATES;

CERAMIC COATINGS;

CERAMIC COATING; PASSIVATION; PLASMA TREATMENT; SILICON NITRIDE; VAPOR DEPOSITION;

EID: 0033387841     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00135-8     Document Type: Conference Paper

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