Plasma-enhanced chemical vapor deposition of silicon nitride below 250°C

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 299-303

  Kuo, Yue ^a   Lee, Hyun Ho ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; LOW TEMPERATURE EFFECTS; SILICON NITRIDE; SUBSTRATES;

PLASMA POWER;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0037136179     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00134-3     Document Type: Article

References (7)