Characterisation of the silicon nitride thin films deposited by plasma magnetron

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 754-757

  Batan, A ^a   Franquet, A ^b   Vereecken, J ^b   Reniers, F ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

FTIR; Plasma reactive magnetron sputtering; Silicon nitride thin films stoichiometry; XPS

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SILICON NITRIDE; STOICHIOMETRY;

FILM COMPOSITION; PLASMA REACTIVE MAGNETRON SPUTTERING; SILICON NITRIDE THIN FILMS STOICHIOMETRY;

THIN FILMS;

EID: 42449151820     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2730     Document Type: Conference Paper

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