Initiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 4, 2012, Pages

  Aresta, Gianfranco ^a   Palmans, Jurgen ^a   Van De Sanden, Mauritius C M ^a,b   Creatore, Mariadriana ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DUTCH INSTITUTE FOR FUNDAMENTAL ENERGY RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BULK GROWTH; DEGREE OF CONVERSION; DEPOSITED LAYER; FTIR; GROWTH STAGES; IN-SITU; KEY PROCESS; MOISTURE PERMEATION; ORGANOSILICONES; PROCESS WINDOW; REAL TIME SPECTROSCOPIC ELLIPSOMETRY; VINYL GROUP;

ADSORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONOMERS; SPECTROSCOPIC ELLIPSOMETRY; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 84863688037     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4711762     Document Type: Article

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