Single-chamber deposition of multilayer barriers by plasma enhanced and initiated chemical vapor deposition of organosilicones

Plasma Processes and Polymers

Volumn 7, Issue 7, 2010, Pages 561-570

  Coclite, Anna Maria ^b   Ozaydin Ince, Gozde ^a   Palumbo, Fabio ^c   Milella, Antonella ^b   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b UNIVERSITY OF BARI   (Italy)

^c CNR   (Italy)

Author keywords

Barrier multilayers; Films; Initiated cvd; Organosilicon precursors; Plasma polymerization

Indexed keywords

BARRIER LAYERS; CARBON RICH; CROSSLINKED; IMPROVEMENT FACTORS; INITIATED CVD; MULTILAYER BARRIERS; MULTILAYER STACKS; MULTILAYERS FILMS; NOVEL TECHNIQUES; ORGANO-SILICON PRECURSOR; ORGANOSILICON FILMS; ORGANOSILICONES; PLASMA ASSISTED DEPOSITION; POLYMER SUBSTRATE; SUBSTRATE ROUGHNESS; UNDERLAYERS; WATER VAPOR PERMEATION;

CHEMICAL VAPOR DEPOSITION; COATINGS; CROSSLINKING; ION BOMBARDMENT; MULTILAYERS; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SILICON COMPOUNDS; SUBSTRATES; WATER VAPOR;

PLASMA DEPOSITION;

EID: 77954930661     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900139     Document Type: Article

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