Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9400-9405

  Martin, Tyler P ^a   Lau, Kenneth K S ^a   Chan, Kelvin ^a   Mao, Yu ^a   Gupta, Malancha ^a   Shannan O'Shaughnessy, W ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Antimicrobial; Chemical vapor deposition; HWCVD; plasma Polymerization; Polymer coating; Polymer thin film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CROSSLINKING; FREE RADICAL REACTIONS; FUNCTIONAL POLYMERS; GROWTH RATE; NANOSTRUCTURED MATERIALS; PLASMA POLYMERIZATION; THIN FILMS;

INITIATED CHEMICAL VAPOR DEPOSITION; NANOCOATINGS; POLYMER COATING;

PLASTIC COATINGS;

CHEMICAL VAPOR DEPOSITION; CROSSLINKING; FREE RADICAL REACTIONS; FUNCTIONAL POLYMERS; GROWTH RATE; NANOSTRUCTURED MATERIALS; PLASMA POLYMERIZATION; PLASTIC COATINGS; THIN FILMS;

EID: 34547684023     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.05.003     Document Type: Article

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