Flexible cross-linked organosilicon thin films by initiated chemical vapor deposition

Macromolecules

Volumn 42, Issue 21, 2009, Pages 8138-8145

  Coclite, Anna Maria ^a   Ozaydin Ince, Gozde ^b   D'Agostino, Riccardo ^a   Gleason, Karen K ^b  

^a UNIVERSITY OF BARI   (Italy)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENDING CYCLES; CROSS-LINKED FILMS; CROSS-LINKING DEGREE; DEPOSITION PROCESS; FILM FORMATIONS; FLAT SURFACES; HIGH-ADHESION; KINETIC ANALYSIS; METHYLENE BRIDGE; ORGANOSILICON THIN FILMS; SUBSTRATE TEMPERATURE; THIN FILM ELECTRONICS; VINYL GROUP;

ACTIVATION ANALYSIS; ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CROSSLINKING; SUBSTRATES; THIN FILMS;

DEPOSITION;

EID: 70449346652     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma901431m     Document Type: Article

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