Initiated chemical vapor deposition of trivinyltrimethylcyclotrisiloxane for biomaterial coatings

Langmuir

Volumn 22, Issue 16, 2006, Pages 7021-7026

  O'Shaughnessy, W Shannan ^a   Gao, Meiling ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIOMATERIAL COATINGS; CROSS-LINKED MATRIX; FILAMENT TEMPERATURES; FREE-RADICAL-GENERATING INITIATOR; ORGANOSILICON POLYMERS;

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC INSULATION; FREE RADICALS; MONOMERS; REACTION KINETICS; SILICONE COATINGS; SURFACE PHENOMENA; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYSILICON;

BIOMATERIAL; SILOXANE; TERT BUTYL HYDROPEROXIDE;

ARTICLE; CHEMISTRY; HEAT; KINETICS; SPECTROMETRY; VOLATILIZATION;

COATED MATERIALS, BIOCOMPATIBLE; HEAT; KINETICS; SILOXANES; SPECTROMETRY, X-RAY EMISSION; TERT-BUTYLHYDROPEROXIDE; VOLATILIZATION;

EID: 33747188968     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0607858     Document Type: Article

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