Controllable chemical vapor deposition of large area uniform nanocrystalline graphene directly on silicon dioxide

Journal of Applied Physics

Volumn 111, Issue 4, 2012, Pages

  Sun, Jie ^a   Lindvall, Niclas ^a   Cole, Matthew T ^b   Wang, Teng ^a   Booth, Tim J ^c   Bggild, Peter ^c   Teo, Kenneth B K ^d   Liu, Johan ^a   Yurgens, August ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^d AIXTRON Nanoinstruments Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN THIN FILMS; CARBON STRUCTURES; CRYSTALLINE DOMAINS; DEVICE PERFORMANCE; ELECTRICAL MEASUREMENT; NANOCRYSTALLINES; OHMIC BEHAVIOR; OXIDIZED SILICON SUBSTRATES; ROOM TEMPERATURE; SCANNING ELECTRONS; TRANSPARENT ELECTRODE; TRANSPORT MEASUREMENTS;

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELD EFFECTS; GRAPHENE; MONOLAYERS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICA; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 84863270620     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3686135     Document Type: Article

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