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Volumn 100, Issue 2, 2012, Pages

Noncatalytic chemical vapor deposition of graphene on high-temperature substrates for transparent electrodes

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED THICKNESS; DEPOSITION TIME; FLAT SUBSTRATES; HIGH TEMPERATURE; HYDROCARBON PYROLYSIS; NANOCRYSTALLINES; NON-CATALYTIC; NON-METALLIC SUBSTRATES; PRECURSOR CONCENTRATION; TRANSMISSION SPECTROSCOPY; TRANSPARENT ELECTRODE; TRANSPORT MEASUREMENTS;

EID: 84862908647     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3675632     Document Type: Article
Times cited : (72)

References (31)
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    • See supplementary material at E-APPLAB-100-033202 for more characterization of graphene directly deposited on insulators.
    • See supplementary material at http://dx.doi.org/10.1063/1.3675632 E-APPLAB-100-033202 for more characterization of graphene directly deposited on insulators.
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    • 3 formed from aluminum chelate compound
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    • J. K. Yu, S. Ueno, H. X. Li, and K. Hiragushi, J. Eur. Ceram. Soc. 19, 2843 (1999). Some high-temperature dielectrics can be catalytic in powder form; nevertheless, flat substrates can hardly dissolve or react with C and, therefore, play no or weak catalytic role in graphitization. 10.1016/S0955-2219(99)00065-5 (Pubitemid 30506184)
    • (1999) Journal of the European Ceramic Society , vol.19 , Issue.16 , pp. 2843-2848
    • Yu, J.K.1    Ueno, S.2    Li, H.X.3    Hiragushi, K.4
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    • Z. Liu, J. Z. Liu, Y. Cheng, and Q. Zheng, e-print arXiv:1104.1469v1 (unpublished).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.