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Applied Physics Letters

Volumn 98, Issue 25, 2011, Pages

Large-area uniform graphene-like thin films grown by chemical vapor deposition directly on silicon nitride

(5) Sun, Jie a Lindvall, Niclas a Cole, Matthew T b Teo, Kenneth B K c Yurgens, August a

a CHALMERS UNIVERSITY OF TECHNOLOGY (Sweden)

b UNIVERSITY OF CAMBRIDGE (United Kingdom)

c AIXTRON Nanoinstruments Ltd (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; GRAPHITIC STRUCTURES; GROWTH CONDITIONS; HYDROCARBON PYROLYSIS; METAL CATALYST; OHMIC BEHAVIOR; ROOM TEMPERATURE; TRANSPARENT ELECTRODE;

CARBON CLUSTERS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; FILM GROWTH; GRAPHENE; HYDROCARBONS; PETROLEUM CHEMISTRY; PYROLYSIS; RAMAN SPECTROSCOPY; SILICON NITRIDE;

CARBON FILMS;

EID: 79959625948 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3602921 Document Type: Article

Times cited : (92)

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