Silanization of low-temperature-plasma synthesized silicon quantum dots for production of a tunable, stable, colloidal solution

Journal of Physical Chemistry C

Volumn 116, Issue 6, 2012, Pages 3979-3987

  Anderson, I E ^a   Shircliff, R A ^a   MacAuley, C ^b   Smith, D K ^c   Lee, B G ^c   Agarwal, S ^a   Stradins, P ^c   Collins, R T ^a  

^a Department of Geology and Geological Engineering   (United States)

^b Montana State University   (United States)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDAL SOLUTIONS; COLLOIDAL SUSPENSIONS; ETCHING PROCESS; HYDROXYL-TERMINATED; MULTILAYER FORMATION; PHOTOLUMINESCENCE QUANTUM YIELDS; SILANIZATIONS; SILICON DOTS; SILICON QUANTUM DOTS; SINGLE POINT; SYNTHETIC TECHNIQUES; WET-CHEMICAL ETCH; WET-ETCH;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOLUMINESCENCE SPECTROSCOPY; QUANTUM YIELD; SEMICONDUCTOR QUANTUM DOTS; SILANES; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; WET ETCHING;

SUSPENSIONS (FLUIDS);

EID: 84863141066     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp211569a     Document Type: Article

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