Study on the mechanism of silicon etching in HNO3-rich HF/HNO3 mixtures inf

Journal of Physical Chemistry C

Volumn 111, Issue 5, 2007, Pages 2133-2140

  Steinert, M ^a   Acker, J ^a   Oswald, S ^a   Wetzig, K ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY MIXTURES; CONCENTRATION (PROCESS); DECOMPOSITION; ETCHING; NITROGEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN TERMINATION; NITRITE ION CONCENTRATION; REACTIVE SPECIES; SILICON ETCHING;

SILICON;

EID: 33847416279     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp066348j     Document Type: Article

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