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Volumn 6, Issue 6, 2012, Pages 5234-5241

Integration of hexagonal boron nitride with quasi-freestanding epitaxial graphene: Toward wafer-scale, high-performance devices

Author keywords

CVD; epitaxial grapheme; field effect transistor; gate dielectric; grapheme; h BN; hexagonal boron nitride

Indexed keywords

COPPER FOILS; COPPER SUBSTRATES; ELECTRICAL TRANSPORT PROPERTIES; ELECTRONIC DEVICE; EPITAXIAL GRAPHEME; EPITAXIAL GRAPHENE; GRAPHEME; GRAPHENE TRANSISTORS; H-BN; HALL EFFECT MEASUREMENT; HALL MEASUREMENTS; HEXAGONAL BORON NITRIDE; HEXAGONAL BORON NITRIDE (H-BN); HIGH PERFORMANCE DEVICES; REMOTE SURFACES; STRESS-INDUCED; TEMPERATURE DEPENDENT; THERMAL CVD; TRANSFER PROCESS; WAFER-SCALE;

EID: 84862854764     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn300996t     Document Type: Article
Times cited : (128)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.