High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 71-73

  Morrison, N A ^a   Rodil, S E ^a   Ferrari, A C ^a   Robertson, J ^a   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Electron cyclotron wave resonance; High rate deposition; Tetrahedral amorphous carbon

Indexed keywords

EID: 0001905813     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01187-0     Document Type: Article

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