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Volumn 108-109, Issue , 1998, Pages 520-525

Experiments and modelling of combined PVD and CVD processes using a hollow cathode arc discharge plasma

Author keywords

a C:H; Arc discharge; Graded coating; Hollow cathode; Modelling

Indexed keywords

ADHESION; CATHODES; EVAPORATION; HYDROCARBONS; LANTHANUM COMPOUNDS; MATHEMATICAL MODELS; SUBSTRATES;

EID: 0032182681     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00638-0     Document Type: Article
Times cited : (4)

References (16)
  • 14
    • 0040039730 scopus 로고
    • Max-Planck-Institut für Plasmaphysik, Garching, IPP 1/62
    • W. Lotz, Max-Planck-Institut für Plasmaphysik, Garching, IPP 1/62, 1967.
    • (1967)
    • Lotz, W.1
  • 16
    • 0001794996 scopus 로고
    • in: F.C. Mattacotta, G. Ottaviani (Eds.), World Scientific, Singapore
    • P.B. Barna, M. Adamik, Science and Technology of Thin Films, in: F.C. Mattacotta, G. Ottaviani (Eds.), World Scientific, Singapore, 1995, p. 1.
    • (1995) Science and Technology of Thin Films , pp. 1
    • Barna, P.B.1    Adamik, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.