A high density hollow cathode plasma PECVD technique for depositing films on the internal surfaces of cylindrical substrates

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Lusk, D ^a   Casserly, T ^b   Gupta, M ^b   Boinapally, K ^b   Cao, Y ^b   Ramamurti, R ^b   Desai, P ^b  

^a Sub One Europe Ltd   (United Kingdom)

^b Sub One Technology   (United States)

Author keywords

Corrosion; Diamond like carbon; Plasma enhanced chemical vapour deposition; Thin films

Indexed keywords

ABRASIVE MEDIA; CHEMICAL VAPOUR DEPOSITION; COMPONENT LIFE; CORROSION-RESISTANT; CYLINDRICAL SUBSTRATE; DIAMOND-LIKE CARBON; DIRECT CURRENT; HIGH DENSITY; HOLLOW CATHODES; INTERNAL SURFACES; NOVEL TECHNIQUES; PLASMA CHAMBERS;

CARBON FILMS; CORROSION; DEPOSITION; DIAMONDS; PIPE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THIN FILMS;

DIAMOND LIKE CARBON FILMS;

EID: 77954895543     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931011     Document Type: Conference Paper

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