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Volumn 132, Issue 1, 2012, Pages 114-121

FeFET logic circuits for operating a 64 kb FeNAND flash memory array

Author keywords

[No Author keywords available]

Indexed keywords

BASIC OPERATION; BIT LINES; ELECTRICAL DATA; MEMORY CELL; MEMORY CELL ARRAYS; STATISTICAL DISTRIBUTION; TEST ELEMENTS;

EID: 84862095898     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584587.2012.660836     Document Type: Conference Paper
Times cited : (16)

References (16)
  • 3
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    • Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory
    • S. Sakai and M. Takahashi, Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory. Materials 3, 4950-4964 (2010).
    • (2010) Materials , vol.3 , pp. 4950-4964
    • Sakai, S.1    Takahashi, M.2
  • 4
    • 2942737378 scopus 로고    scopus 로고
    • Metal-ferroelectric-insulator-semiconductor memory FET with long retention and high endurance
    • S. Sakai and R. Ilangovan, Metal-ferroelectric-insulator-semiconductor memory FET with long retention and high endurance. IEEE Electron Device Lett. 25, 369-371 (2004).
    • (2004) IEEE Electron Device Lett. , vol.25 , pp. 369-371
    • Sakai, S.1    Ilangovan, R.2
  • 6
    • 33751582557 scopus 로고    scopus 로고
    • 9/Hf-Al-O/Si field-effect transistors at elevated temperatures
    • 9/Hf-Al-O/Si field-effect transistors at elevated temperatures. Appl. Phys. Lett. 89, 22910 (2006).
    • (2006) Appl. Phys. Lett. , vol.89 , pp. 22910
    • Li, Q.H.1    Sakai, S.2
  • 8
    • 64249164674 scopus 로고    scopus 로고
    • Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation
    • Q. H. Li, T. Horiuchi, S. Wang, M. Takahashi, and S. Sakai, Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation. Semicond. Sci. and Technol. 24, 025012 (2009).
    • (2009) Semicond. Sci. and Technol. , vol.24 , pp. 025012
    • Li, Q.H.1    Horiuchi, T.2    Wang, S.3    Takahashi, M.4    Sakai, S.5
  • 9
    • 32044451564 scopus 로고    scopus 로고
    • Self-align-gate metal/ferroelectric/insulator/semiconductor field-effect transistors with long memory retention
    • M. Takahashi and S. Sakai, Self-align-gate metal/ferroelectric/insulator/ semiconductor field-effect transistors with long memory retention. Jpn. J. Appl. Phys. 44, L800-L802 (2005).
    • (2005) Jpn. J. Appl. Phys. , vol.44
    • Takahashi, M.1    Sakai, S.2
  • 10
    • 78649960985 scopus 로고    scopus 로고
    • Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors
    • L. V. Hai, M. Takahashi, and S. Sakai, Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors. Semicond. Sci. and Technol. 25, 115013 (2010).
    • (2010) Semicond. Sci. and Technol. , vol.25 , pp. 115013
    • Hai, L.V.1    Takahashi, M.2    Sakai, S.3
  • 11
    • 79959919984 scopus 로고    scopus 로고
    • Downsizing of ferroelectric-gate field-effect-transistors for ferroelectric-NAND flash memory cells
    • L. V. Hai, M. Takahashi, and S. Sakai, Downsizing of ferroelectric-gate field-effect-transistors for ferroelectric-NAND flash memory cells. Int. Memory Workshop Proc. 175-178 (2011).
    • (2011) Int. Memory Workshop Proc. , pp. 175-178
    • Hai, L.V.1    Takahashi, M.2    Sakai, S.3
  • 16
    • 77957929151 scopus 로고    scopus 로고
    • A 1.0 V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD
    • K. Miyaji, S. Noda, T. Hatanaka, M. Takahashi, S. Sakai, and K. Takeuchi, A 1.0 V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD. Int. Memory Workshop Proc. 42-45 (2010).
    • (2010) Int. Memory Workshop Proc. , pp. 42-45
    • Miyaji, K.1    Noda, S.2    Hatanaka, T.3    Takahashi, M.4    Sakai, S.5    Takeuchi, K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.