메뉴 건너뛰기




Volumn , Issue , 2011, Pages

0.5V bit-line-voltage self-boost-programming in ferroelectric-NAND flash memory

Author keywords

Fe NAND; FeFET; Self Boost Program

Indexed keywords

BIT LINES; FE-NAND; FEFET; FLOATING GATES; LOWER-POWER CONSUMPTION; MEMORY CELL ARRAYS; SELF-BOOST PROGRAM;

EID: 79959984935     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMW.2011.5873233     Document Type: Article
Times cited : (8)

References (12)
  • 2
    • 70350660543 scopus 로고    scopus 로고
    • Operational method of ferroelectric (Fe-) NAND flash memory array
    • September
    • S. Wang, M. Takahashi, Q.-H Li, K. Takeuchi, and S. Sakai, "Operational method of ferroelectric (Fe-) NAND flash memory array," Semicond. Sci. Technol., vol. 24, 105029, September 2009.
    • (2009) Semicond. Sci. Technol. , vol.24 , pp. 105029
    • Wang, S.1    Takahashi, M.2    Li, Q.-H.3    Takeuchi, K.4    Sakai, S.5
  • 4
    • 77957929151 scopus 로고    scopus 로고
    • A 1.0V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD
    • K. Miyaji, S. Noda,T. Hatanaka, M. Takahashi, S. Sakai, and K. Takeuchi, "A 1.0V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD," IEEE Inter. Memory Worshop Proc., pp. 42-45, 2010.
    • (2010) IEEE Inter. Memory Worshop Proc. , pp. 42-45
    • Miyaji, K.1    Noda, S.2    Hatanaka, T.3    Takahashi, M.4    Sakai, S.5    Takeuchi, K.6
  • 5
    • 2942737378 scopus 로고    scopus 로고
    • Metal-ferroelectric-insulator-semiconductor memory FET with long retention and high endurance
    • June
    • S. Sakai and R. Ilangovan, "Metal-ferroelectric-insulator- semiconductor memory FET with long retention and high endurance," IEEE Electron. Devices Lett., vol. 25, pp. 369-371, June 2004.
    • (2004) IEEE Electron. Devices Lett. , vol.25 , pp. 369-371
    • Sakai, S.1    Ilangovan, R.2
  • 7
    • 64249164674 scopus 로고    scopus 로고
    • Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation
    • January
    • Q.-H. Li, T. Horiuchi, S. Wang, M. Takahashi, and S. Sakai, "Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation," Semicond. Sci. Technol., vol. 24, 025012, January 2009.
    • (2009) Semicond. Sci. Technol. , vol.24 , pp. 025012
    • Li, Q.-H.1    Horiuchi, T.2    Wang, S.3    Takahashi, M.4    Sakai, S.5
  • 8
    • 42449124753 scopus 로고    scopus 로고
    • Threshold-voltage distribution of pt/SrBi2Ta2O9/Hf-al-O/Si MFIS FETs
    • March
    • Q.-H. Li, M. Takahashi, T. Horiuchi, S. Wang, and S. Sakai, "Threshold-voltage distribution of Pt/SrBi2Ta2O9/Hf-Al-O/Si MFIS FETs," Semicond. Sci. Technol., vol. 23, 045011, March 2008.
    • (2008) Semicond. Sci. Technol. , vol.23 , pp. 045011
    • Li, Q.-H.1    Takahashi, M.2    Horiuchi, T.3    Wang, S.4    Sakai, S.5
  • 9
    • 32044451564 scopus 로고    scopus 로고
    • Self-aligned-gate metal/ferroelectric/insulator/semiconductor field-effect transistors with long memory retention
    • DOI 10.1143/JJAP.44.L800
    • M. Takahashi and S. Sakai, "Self-aligned-gate metal/ferroelectric/ insulator/ semiconductor field-effect transistors with long memory retention," Jpn. J. Appl. Phys., vol. 44, pp. L800-L802, June 2005. (Pubitemid 43200756)
    • (2005) Japanese Journal of Applied Physics, Part 2: Letters , vol.44 , Issue.24-27
    • Takahashi, M.1    Sakai, S.2
  • 10
    • 79959981576 scopus 로고    scopus 로고
    • Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory
    • November
    • S. Sakai and M. Takahashi, "Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory," Materials, vol. 3, pp. 4950-4964, November 2010.
    • (2010) Materials , vol.3 , pp. 4950-4964
    • Sakai, S.1    Takahashi, M.2
  • 11
    • 78649960985 scopus 로고    scopus 로고
    • Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors
    • October
    • L. V. Hai, M. Takahashi, and S. Sakai, "Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors," Semicond. Sci. Technol., vol. 25, 115013, October 2010.
    • (2010) Semicond. Sci. Technol. , vol.25 , pp. 115013
    • Hai, L.V.1    Takahashi, M.2    Sakai, S.3
  • 12
    • 79959919984 scopus 로고    scopus 로고
    • Downsizing of ferroelectric-gate field-effect-transistors for ferroelectric-NAND flash memory cells
    • to be presented
    • L. V. Hai, M. Takahashi, and S. Sakai, "Downsizing of Ferroelectric-Gate Field-Effect-Transistors for Ferroelectric-NAND Flash Memory Cells," to be presented in this workshop (IMW 2011).
    • This Workshop (IMW 2011)
    • Hai, L.V.1    Takahashi, M.2    Sakai, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.