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1
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50249086962
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Highly scalable fe(ferroelectric)-NAND cell with MFIS (metal-ferroelectric-insulator-semiconductor) structure for sub-10nm tera-bit capacity NAND flash memory
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S. Sakai, M. Takahashi, K. Takeuchi, Q.-H. Li, T. Horiuchi, S. Wang, K.-Y. Yun, M. Takamiya, and T. Sakurai, "Highly scalable Fe(ferroelectric)-NAND cell with MFIS (metal-ferroelectric-insulator- semiconductor) structure for sub-10nm tera-bit capacity NAND flash memory," Proc. of the 23rd IEEE Non-Volatile Semiconductor Memory Workshop and 3rd International Conf. on Memory Technology and Design, pp. 103-105, 2008.
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(2008)
Proc. of the 23rd IEEE Non-volatile Semiconductor Memory Workshop and 3rd International Conf. on Memory Technology and Design
, pp. 103-105
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Sakai, S.1
Takahashi, M.2
Takeuchi, K.3
Li, Q.-H.4
Horiuchi, T.5
Wang, S.6
Yun, K.-Y.7
Takamiya, M.8
Sakurai, T.9
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2
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70350660543
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Operational method of ferroelectric (Fe-) NAND flash memory array
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September
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S. Wang, M. Takahashi, Q.-H Li, K. Takeuchi, and S. Sakai, "Operational method of ferroelectric (Fe-) NAND flash memory array," Semicond. Sci. Technol., vol. 24, 105029, September 2009.
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(2009)
Semicond. Sci. Technol.
, vol.24
, pp. 105029
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Wang, S.1
Takahashi, M.2
Li, Q.-H.3
Takeuchi, K.4
Sakai, S.5
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3
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70449369465
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Ferroelectric(Fe)-NAND flash memory with non-volatile page buffer for data center application enterprise solid-state drives (SSD)
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T. Hatanaka, R. Yajima, T. Horiuchi, S. Wang, X. Zhang, M. Takahashi, S. Sakai, and K. Takeuchi, "Ferroelectric(Fe)-NAND flash memory with non-volatile page buffer for data center application enterprise solid-state drives (SSD)," IEEE Symp. VLSI Circuits Dig. of Tech. Papers, pp. 78-79, 2009.
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(2009)
IEEE Symp. VLSI Circuits Dig. of Tech. Papers
, pp. 78-79
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Hatanaka, T.1
Yajima, R.2
Horiuchi, T.3
Wang, S.4
Zhang, X.5
Takahashi, M.6
Sakai, S.7
Takeuchi, K.8
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4
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77957929151
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A 1.0V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD
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K. Miyaji, S. Noda,T. Hatanaka, M. Takahashi, S. Sakai, and K. Takeuchi, "A 1.0V power supply, 9.5Gbyte/sec write speed, single-cell self-boost program scheme for ferroelectric NAND flash SSD," IEEE Inter. Memory Worshop Proc., pp. 42-45, 2010.
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(2010)
IEEE Inter. Memory Worshop Proc.
, pp. 42-45
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Miyaji, K.1
Noda, S.2
Hatanaka, T.3
Takahashi, M.4
Sakai, S.5
Takeuchi, K.6
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5
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2942737378
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Metal-ferroelectric-insulator-semiconductor memory FET with long retention and high endurance
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June
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S. Sakai and R. Ilangovan, "Metal-ferroelectric-insulator- semiconductor memory FET with long retention and high endurance," IEEE Electron. Devices Lett., vol. 25, pp. 369-371, June 2004.
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(2004)
IEEE Electron. Devices Lett.
, vol.25
, pp. 369-371
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Sakai, S.1
Ilangovan, R.2
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6
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77951247316
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2/Si ferroelectric-gate field-effect transistors by oxynitriding si
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April
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2/Si ferroelectric-gate field-effect transistors by oxynitriding Si," Semicond. Sci. Technol., vol. 25, 055005, April 2010.
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(2010)
Semicond. Sci. Technol.
, vol.25
, pp. 055005
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Horiuchi, T.1
Takahashi, M.2
Li, Q.-H.3
Wang, S.4
Sakai, S.5
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7
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64249164674
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Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation
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January
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Q.-H. Li, T. Horiuchi, S. Wang, M. Takahashi, and S. Sakai, "Threshold voltage adjustment of ferroelectric-gate field effect transistors by ion implantation," Semicond. Sci. Technol., vol. 24, 025012, January 2009.
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(2009)
Semicond. Sci. Technol.
, vol.24
, pp. 025012
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Li, Q.-H.1
Horiuchi, T.2
Wang, S.3
Takahashi, M.4
Sakai, S.5
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8
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42449124753
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Threshold-voltage distribution of pt/SrBi2Ta2O9/Hf-al-O/Si MFIS FETs
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March
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Q.-H. Li, M. Takahashi, T. Horiuchi, S. Wang, and S. Sakai, "Threshold-voltage distribution of Pt/SrBi2Ta2O9/Hf-Al-O/Si MFIS FETs," Semicond. Sci. Technol., vol. 23, 045011, March 2008.
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(2008)
Semicond. Sci. Technol.
, vol.23
, pp. 045011
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Li, Q.-H.1
Takahashi, M.2
Horiuchi, T.3
Wang, S.4
Sakai, S.5
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9
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32044451564
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Self-aligned-gate metal/ferroelectric/insulator/semiconductor field-effect transistors with long memory retention
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DOI 10.1143/JJAP.44.L800
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M. Takahashi and S. Sakai, "Self-aligned-gate metal/ferroelectric/ insulator/ semiconductor field-effect transistors with long memory retention," Jpn. J. Appl. Phys., vol. 44, pp. L800-L802, June 2005. (Pubitemid 43200756)
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(2005)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.44
, Issue.24-27
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Takahashi, M.1
Sakai, S.2
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10
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79959981576
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Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory
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November
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S. Sakai and M. Takahashi, "Recent progress of ferroelectric-gate field-effect transistors and applications to nonvolatile logic and FeNAND flash memory," Materials, vol. 3, pp. 4950-4964, November 2010.
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(2010)
Materials
, vol.3
, pp. 4950-4964
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Sakai, S.1
Takahashi, M.2
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11
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78649960985
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Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors
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October
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L. V. Hai, M. Takahashi, and S. Sakai, "Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors," Semicond. Sci. Technol., vol. 25, 115013, October 2010.
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(2010)
Semicond. Sci. Technol.
, vol.25
, pp. 115013
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Hai, L.V.1
Takahashi, M.2
Sakai, S.3
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12
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79959919984
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Downsizing of ferroelectric-gate field-effect-transistors for ferroelectric-NAND flash memory cells
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to be presented
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L. V. Hai, M. Takahashi, and S. Sakai, "Downsizing of Ferroelectric-Gate Field-Effect-Transistors for Ferroelectric-NAND Flash Memory Cells," to be presented in this workshop (IMW 2011).
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This Workshop (IMW 2011)
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Hai, L.V.1
Takahashi, M.2
Sakai, S.3
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