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Volumn , Issue , 2008, Pages 103-105
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Highly scalable Fe(ferroelectric)-NAND cell with MFIS(metal-ferroelectric- insulator-semiconductor) structure for sub-10nm tera-bit capacity NAND flash memories
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Author keywords
FeFET; Ferroelectric gate; NAND Flash; Scalable
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Indexed keywords
DATA STORAGE EQUIPMENT;
ELECTRIC CONDUCTIVITY;
FERROELECTRICITY;
MESFET DEVICES;
METALS;
NAND CIRCUITS;
SEMICONDUCTOR DEVICE STRUCTURES;
SEMICONDUCTOR MATERIALS;
SEMICONDUCTOR STORAGE;
TECHNOLOGY;
DATA-RETENTION;
FEFET;
FERROELECTRIC GATE;
FERROELECTRIC GATES;
INTERNATIONAL CONFERENCES;
LOW VOLTAGES;
MEMORY TECHNOLOGY;
METAL FERROELECTRIC INSULATOR SEMICONDUCTORS;
NAND FLASH;
NAND FLASH MEMORIES;
NON-VOLATILE;
READ DISTURB;
SCALABLE;
SEMICONDUCTOR MEMORIES;
VOLTAGE OPERATIONS;
FLASH MEMORY;
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EID: 50249086962
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/NVSMW.2008.36 Document Type: Conference Paper |
Times cited : (59)
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References (6)
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