The prospects of a subnanometer focused neon ion beam

Scanning

Volumn 34, Issue 2, 2012, Pages 129-134

  Rahman, F H M ^a   McVey, Shawn ^a   Farkas, Louis ^a   Notte, John A ^a   Tan, Shida ^b   Livengood, Richard H ^b  

^a Carl Zeiss Vision Inc USA   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

beam chemistry; damage; gas field ion source; gas injection system; helium ion microscope; imaging; ion milling; lithography; neon; sputter; SRIM; vacancy

Indexed keywords

DAMAGE; GAS FIELDS; GAS INJECTION SYSTEM; HELIUM ION; ION MILLING; SPUTTER; SRIM;

GAS INDUSTRY; HELIUM; IMAGING TECHNIQUES; ION BEAMS; ION MICROSCOPES; ION SOURCES; LITHOGRAPHY; VACANCIES;

NEON;

COPPER; HELIUM; NEON; SILICON;

ATOM; EQUIPMENT; GAS FIELD ION SOURCE; HELIUM ION MICROSCOPE; MICROSCOPE; NEON ION BEAM; PARTICLE RADIATION; PRIORITY JOURNAL; REVIEW; SIMULATION;

IONS; MICROSCOPY; NEON; RESEARCH;

EID: 84860600589     PISSN: 01610457     EISSN: 19328745     Source Type: Journal    
DOI: 10.1002/sca.20268     Document Type: Review

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