Gas field ion source and liquid metal ion source charged particle material interaction study for semiconductor nanomachining applications

Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

  Tan, Shida ^a   Livengood, Richard ^a   Shima, Darryl ^a   Notte, John ^b   McVey, Shawn ^b  

^a INTEL CORPORATION   (United States)

^b Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; GAS INDUSTRY; INTELLIGENT SYSTEMS; ION BEAMS; ION SOURCES; MONTE CARLO METHODS; NANOTECHNOLOGY; NATURAL GAS FIELDS; SUBSTRATES;

BEAM SPOT SIZE; GAS FIELD ION SOURCES; INTERACTION STUDIES; LIQUID METAL ION SOURCE; MANUFACTURING TECHNOLOGIES; MATERIAL INTERACTIONS; NANOMACHINING; PARTICLE MATERIALS; SEMICONDUCTOR MANUFACTURING; TECHNOLOGY NODES;

METAL IONS;

EID: 78650077017     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3511509     Document Type: Article

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