Neon ion microscope nanomachining considerations

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2011, Pages 40-45

  Tan, Shida ^a   Livengood, Richard H ^a   Hallstein, Roy ^a   Shima, Darryl ^a   Greenzweig, Yuval ^a   Notte, John ^b   McVey, Shawn ^b  

^a INTEL CORPORATION   (United States)

^b Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSED ION BEAM TECHNOLOGY; GAS CHEMISTRY; IMAGING RESOLUTIONS; IN-DEPTH ANALYSIS; MACHINING PRECISION; NANOMACHINING; PROCESS TECHNOLOGIES; SUB-SURFACE MATERIALS;

FAILURE ANALYSIS; ION MICROSCOPES;

NEON;

EID: 84866635008     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)

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