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Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4703-4706

Structure and morphology of aluminium doped Zinc-oxide layers prepared by atomic layer deposition

(4) Baji, Zs a Labadi Z a Horvath Z E a Barsony I a

a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE (Hungary)

Author keywords

Aluminium doping; Atomic layer deposition; Orientation; Resistivity; TCO; XRD; ZnO

Indexed keywords

ALUMINIUM CONTENT; ATOMIC LAYER DEPOSITED; COMPRESSIVE STRAIN; CONDUCTION MECHANISM; CRYSTALLINE PROPERTIES; CRYSTALLITE ORIENTATION; DEPOSITION TEMPERATURES; GRAIN SIZE; STRUCTURE AND MORPHOLOGY; SUBSTRATE TEMPERATURE; TCO; XRD; ZNO; ZNO LAYERS;

ATOMIC LAYER DEPOSITION; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ALUMINUM;

EID: 84860315313 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.10.113 Document Type: Conference Paper

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.