Cathodic reduction of copper oxides

Corrosion Reviews

Volumn 29, Issue 1-2, 2011, Pages 51-71

  Su, Yea Yang ^a   Nakayama, Shigeyoshi ^b   Osakai, Toshiyuki ^c  

^a Amorphous Oxide Technology   (United States)

^b SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^c KOBE UNIVERSITY   (Japan)

Author keywords

Cathodic reduction; Copper oxides; Current densities; Electrolytes

Indexed keywords

CATHODIC REDUCTIONS; COPPER SURFACE; CRYSTALLINE ORIENTATIONS; CUPRIC OXIDE; ELECTROLYTE COMPOSITIONS; EXPERIMENTAL PARAMETERS; INTERFACIAL IMPEDANCE; LABORATORY PRACTICES; OXIDE LAYER; OXIDE THICKNESS; PRECISE MEASUREMENTS;

COPPER OXIDES; CURRENT DENSITY; INDUSTRIAL APPLICATIONS; POSITIVE IONS;

ELECTROLYTES;

EID: 84860132001     PISSN: 03346005     EISSN: None     Source Type: Journal    
DOI: 10.1515/CORRREV.2011.001     Document Type: Article

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