Voltammetric characterization for the growth of oxide films formed on copper in air

Zairyo to Kankyo/ Corrosion Engineering

Volumn 51, Issue 12, 2002, Pages 566-570

  Nakayama, Shigeyoshi ^a   Shibata, Masahiro ^a   Kuwabata, Susumu ^b   Osakai, Toshiyuki ^c   Notoya, Takenori ^d  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c KOBE UNIVERSITY   (Japan)

^d HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Copper; Cupric oxide; Cuprous oxide; Parabolic rate law; Pre immersion; Voltammetry

Indexed keywords

COPPER COMPOUNDS; CORROSION; CYCLIC VOLTAMMETRY; ELECTROLYTES; OXIDATION; REACTION KINETICS;

OXIDE FILMS;

FILM GROWTH;

EID: 0036994963     PISSN: 09170480     EISSN: None     Source Type: Journal    
DOI: 10.3323/jcorr1991.51.566     Document Type: Article

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