Thermodynamic modeling of the initial microstructural evolution of oxide films grown on bare copper

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1457-1460

  Reichel, F ^a   Jeurgens, L P H ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Copper; Cu2O; Interfaces; Microstructural evolution; Misfit dislocations; Oxide film growth; Solid phase epitaxy; Thermodynamics

Indexed keywords

DISLOCATIONS (CRYSTALS); EPITAXIAL LAYERS; FILM GROWTH; MICROSTRUCTURAL EVOLUTION; PLASTIC DEFORMATION;

GROWTH STRESSES; SOLID PHASE EPITAXY; SQUARE GRID; THERMODYNAMIC MODELS;

OXIDE FILMS;

EID: 38649106818     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.171     Document Type: Article

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