Voltammetric Characterization of Oxide Films Formed on Copper in Air

Journal of the Electrochemical Society

Volumn 148, Issue 11, 2001, Pages

  Nakayama, Shigeyoshi ^a   Kimura, Atsushi ^a   Shibata, Masahiro ^a   Kuwabata, Susumu ^b,d   Osakai, Toshiyuki ^c  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c KOBE UNIVERSITY   (Japan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002444896     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1409545     Document Type: Article

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