Characterization by Coulometric Reduction of Surface Chemical Components Formed on Copper in Fluorine-Containing Plasmas

Electrochemical and Solid-State Letters

Volumn 6, Issue 12, 2003, Pages

  Vilca Melendez H ^a   Ruas, R ^b   Verdonck, P ^b   Aoki, I V ^b  

^a GUARULHOS UNIVERSITY   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER CORROSION; CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRODES; ETCHING; MICROELECTRONICS; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE CHEMISTRY;

COULOMETRIC REDUCTION (CR); SURFACE CHEMICAL COMPONENTS;

REDUCTION;

EID: 0344083610     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1622207     Document Type: Article

References (19)

1. S. J. Krumbein, B. Newell, and V. Pascucoi, J. Test. Eval., 17, 357 (1989).
2. S. Lee and R. W. Staehle, J. Electrochem. Soc., 142, 2189 (1995).
3. J. A. Allen, Trans. Faraday Soc., 43, 273 (1952).
4. S. P. Sharma, J. Electrochem. Soc., 127, 21 (1980).
5. S. K. Chawla, B. I. Rickett, N. Sankarraman, and H. Payer, Corros. Sci., 32, 1617 (1992).
6. S. Zapikuor and C. Leygraf, J. Electrochem. Soc., 133, 21 (1986).
7. C. Fiaud, M. Safavi, and J. Vedel, Werkst. Korros., 35, 361 (1984).
8. B. I. Rickett and J. H. Payer, J. Electrochem. Soc., 142, 3723 (1995).
9. M. Elwenspoek and H. V. Jansen, Silicon Micromachining, Cambridge University Press, New York (1998).
10. M. Francou, J. S. Daniel, and L. Peccoud, Sens. Actuators A, 46-47, 17 (1995).
11. H. Jansen, M. de Boer, and M. Elwenspoek, in Proceedings of the Ninth International Workshop on Micro Electro Mechanical Systems, San Diego, CA, p. 250 (1996).
12. R. D. Mansano, P. Verdonck, and H. S. Maciel, Sens. Actuators A, 65, 180 (1998).
13. P. Verdonck, C. M. Hasenack, and R. D. Mansano, J. Vac. Sci. Technol. B, 14, 538 (1996),
14. R. Ruas, R. D. Mansano, P. Verdonck, and N. S. Braithwaite, in 15th International Symposium on Plasma Chemistry (ISPC), Vol. III, p. 978, Orleans, France (2001).
15. L. C. Feldman and J. W. Mayer, Fundamentals of Surface and Thin Film Analysis, North-Holland, New York (1986).
16. D. Kahaner, C. Moler, and S. Nash, Numerical Methods and Software, p. 81, Prentice Hall, Englewood Cliffs, NJ, 81 (1977).
17. I. V. Aoki, H. Vilca, F. M. Arruda, and A. G. Ceci, Mater. Sci. Forum, 289, 449 (1998).
18. RUMP Program: http://www.genplot.com/RUMP/index.htm
19. P. Verdonck, J. W. Swart, G. Brasseur, and P. De Geyter, J. Electrochem. Soc., 142, 1971 (1995).