Oxidation of copper alloys studied by analytical transmission electron microscopy cross-sectional specimens

Journal of Materials Research

Volumn 23, Issue 5, 2008, Pages 1350-1357

  Honkanen, Mari ^a   Vippola, Minnamari ^a   Lepistö, Toivo ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN SIZE AND SHAPE; OXIDATION; POLYCRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

COLUMNAR SHAPED LAYER; OXIDE LAYER STRUCTURES;

COPPER ALLOYS;

EID: 44649175772     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0160     Document Type: Article

References (18)

1. A. Cohen: Corrosion: Materials, in Corrosion of Copper and Copper Alloys, ASM Handbooks Online, Vol. 13B (ASM International, Materials Park, OH, 2005), pp. 125-163.
2. 2O islands during in situ oxidation of Cu(001). Appl. Phys. Lett. 81, 241 (2002).
3. L. Sun and J.C. Yang: The low-temperature initial oxidation stages of Cu(100) investigated by in situ ultra-high-vacuum transmission electron microscopy. J. Mater. Res. 20, 1910 (2005).
4. www.outokumpucopper.com (March 31, 2006).
5. Y. Zhu, K. Mimura, and M. Isshiki: A study of initial oxidation of copper in 0.1 MPa oxygen and the effect of purity by metallographic methods. Oxid. Metals 59, 575 (2003).
6. G. Zhou and J.C. Yang: Initial oxiqation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy. J. Mater. Res. 20, 1684 (2005).
7. J.C. Yang, B. Kolasa, J.M. Gibson, and M. Yeadon: Self-limiting oxidation of copper. Appl. Phys. Lett. 73, 2841 (1998).
8. K. Lawless: The oxidation of metals. Rep. Prog. Phys. 37, 231 (1974).
9. D. Cocke, G. Chuah, N. Kruse, and J. Block: Copper oxidation and surface copper oxide stability investigated by pulsed field desorption mass spectrometry. Appl. Surf. Sci. 84, 153 (1995).
10. U. Aniekwe and T. Utigard: High-temperature oxidation of nickel-plated copper vs pore copper. Canadian Metall. Quarterly 38, 277 (1999).
11. S. Ghosh, D. Avasthi, P. Shah, V. Ganesan, A. Gupta, D. Sarangi, R. Bhattacharya, and W. Assmann: Deposition of thin films of different oxides of copper by RF reactive sputtering and their characterization. Vacuum 57, 377 (2000).
12. Y. Zhu, K. Mimura, and M. Isshiki: A study of the initial oxidation of copper in 0.1 MPa oxygen and the effect of purity by metallographic methods. Corros. Sci. 46, 2445 (2004).
13. 2O formation on Cu {100}, Ag/Cu{100}, and Cu(Ag) alloy. Surf. Sci. 583, 157 (2005).
14. 0.5 (001) thin films during in situ oxidation. J. Mater. Res. 20, 1902 (2005).
15. M. Honkanen, M. Vippola, and T. Lepistö: Low temperature oxidation of copper alloys - AEM and AFM characterization. J. Mater. Sci. 42, 4684 (2007).
16. M. Vippola: Microstructural study of aluminum phosphate sealed plasma sprayed alumina and chromia coatings. Doctoral Thesis, Tampere University of Technology, Tampere, Finland (2002).
17. J. McCaffrey and A. Barna: Preparation of cross-sectional TEM samples for low-angle ion milling. Microsc. Res. Tech. 36, 362 (1997).
18. JCPDS No. 5-667. International Center for Diffraction Data (ICDD), Powder Diffraction File Database 1999.