SCOPUS 정보 검색 플랫폼

Volumn 22, Issue 6, 2011, Pages 24-29

Rapid lithography: New photoresists achieve nanoscale resolution

Author keywords

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Indexed keywords

EID: 79960225061 PISSN: 10476938 EISSN: None Source Type: Trade Journal
DOI: 10.1364/OPN.22.6.000024 Document Type: Article

Times cited : (5)

References (6)

1
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- Microlithography by using neutral metastable atoms and self-assembled monolayers
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- Berggren, K.K.¹

2
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- Far-field optical nanoscopy
- S. W. Hell. "Far-field optical nanoscopy", Science 316, 1153(2007).
- (2007) Science , vol.316 , pp. 1153
- Hell, S.W.¹

3
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- Recent progress in multiphoton microfabrication
- S. Maruo and J. T. Fourkas. "Recent progress in multiphoton microfabrication", Laser & Photon. Rev. 2, 100(2008).
- (2008) Laser & Photon. Rev. , vol.2 , pp. 100
- Maruo, S.¹ Fourkas, J.T.²

4
- 66149129610
- Achieving λ/20 resolution by one-color initiation and deactivation of polymerization
- L. Li et al. "Achieving λ/20 resolution by one-color initiation and deactivation of polymerization", Science 324, 910(2009).
- (2009) Science , vol.324 , pp. 910
- Li, L.¹

5
- 77951200062
- Nanoscale photolithography with visible light
- J. T. Fourkas. "Nanoscale photolithography with visible light", J Phys. Chem. Lett. 1, 1221(2010).
- (2010) J Phys. Chem. Lett. , vol.1 , pp. 1221
- Fourkas, J.T.¹

6
- 79951979292
- Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time
- M. P. Stocker et al. "Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time", Nature Chem. 3, 223(2011).
- (2011) Nature Chem. , vol.3 , pp. 223
- Stocker, M.P.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.