SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 159, Issue 5, 2012, Pages

The deterioration of a-IGZO TFTs owing to the copper diffusion after the process of the sourcedrain metal formation

(3) Tai, Ya Hsiang a Chiu, Hao Lin a Chou, Lu Sheng a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL REGION; COPPER DIFFUSION; DEVICE SIMULATORS; INDIUM GALLIUM ZINC OXIDES (IGZO); SOURCE-DRAIN; THIN-FILM TRANSISTOR (TFTS); TRANSFER CURVES;

DETERIORATION; GALLIUM; THIN FILM TRANSISTORS;

COPPER;

EID: 84859346140 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/2.025206jes Document Type: Article

Times cited : (83)

References (25)

1
- 20644459026
- 10.1063/1.1862767
- N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C. H. Park, and D. A. Keszler, J. Appl. Phys., 97 (6), 064505 (2005). 10.1063/1.1862767
- (2005) J. Appl. Phys. , vol.97 , Issue.6 , pp. 064505
- Dehuff, N.L.¹ Kettenring, E.S.² Hong, D.³ Chiang, H.Q.⁴ Wager, J.F.⁵ Hoffman, R.L.⁶ Park, C.H.⁷ Keszler, D.A.⁸

2
- 13544269370
- 10.1063/1.1843286
- H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett., 86 (1), 013503 (2005). 10.1063/1.1843286
- (2005) Appl. Phys. Lett. , vol.86 , Issue.1 , pp. 013503
- Chiang, H.Q.¹ Wager, J.F.² Hoffman, R.L.³ Jeong, J.⁴ Keszler, D.A.⁵

3
- 0032308326
- 10.1557/PROC-508-37
- M. Fryer, E. C. Colgan, E. Galligan, W. Graham, R. Horton, L. Jenkins, R. John, Y. Kuo, K. Latzko, F. Libsch, A. Lien, R. Nywening, R. Polastre, M. E. Rothwell, J. Wilson, R. Wisnieff, and S. Wright, Mat. Res. Soc. Symp. Proc., 508, 37 (1998). 10.1557/PROC-508-37
- (1998) Mat. Res. Soc. Symp. Proc. , vol.508 , pp. 37
- Fryer, M.¹ Colgan, E.C.² Galligan, E.³ Graham, W.⁴ Horton, R.⁵ Jenkins, L.⁶ John, R.⁷ Kuo, Y.⁸ Latzko, K.⁹ Libsch, F.¹⁰ Lien, A.¹¹ Nywening, R.¹² Polastre, R.¹³ Rothwell, M.E.¹⁴ Wilson, J.¹⁵ Wisnieff, R.¹⁶ Wright, S.¹⁷

4
- 84859323471
- SID 96 Digest, 333.
- P. M. Fryer, E. C. Colgan, E. Galligan, W. Graham, R. Horton, D. Hunt, K. Latzko, R Nywening, L. Jenkins, R. John, P. Koke, Y. Kuo, F. Libsch, A. Lien, I. Lovas, R. Polastre, M. E. Rothwell, J. Souk, J. Wilson, R. Wisnieff, and S. Wright, A six-mask TFT-LCD process using copper-cate metallurgy, SID 96 Digest, 1996, 333.
- (1996) A Six-Mask TFT-LCD Process Using Copper-Cate Metallurgy
- Fryer, P.M.¹ Colgan, E.C.² Galligan, E.³ Graham, W.⁴ Horton, R.⁵ Hunt, D.⁶ Latzko, K.⁷ Nywening, R.⁸ Jenkins, L.⁹ John, R.¹⁰ Koke, P.¹¹ Kuo, Y.¹² Libsch, F.¹³ Lien, A.¹⁴ Lovas, I.¹⁵ Polastre, R.¹⁶ Rothwell, M.E.¹⁷ Souk, J.¹⁸ Wilson, J.¹⁹ Wisnieff, R.²⁰ Wright, S.²¹ more..

5
- 0031212637
- (Mar.). 10.1109/55.605448
- H. Sirringhaus, S. D. Theiss, A. Kahn, and S. Wagner, IEEE Electron Device Lett., 18 (8), 388 (Mar. 1997). 10.1109/55.605448
- (1997) IEEE Electron Device Lett. , vol.18 , Issue.8 , pp. 388
- Sirringhaus, H.¹ Theiss, S.D.² Kahn, A.³ Wagner, S.⁴

6
- 36048944461
- 10.1063/1.2753724
- H. H. Hsieh and C. C. Wu, Appl. Phys. Lett., 91 (1), 013502 (2007). 10.1063/1.2753724
- (2007) Appl. Phys. Lett. , vol.91 , Issue.1 , pp. 013502
- Hsieh, H.H.¹ Wu, C.C.²

7
- 9744248669
- (Nov.). 10.1038/nature03090
- K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature, 432, 488 (Nov. 2004). 10.1038/nature03090
- (2004) Nature , vol.432 , pp. 488
- Nomura, K.¹ Ohta, H.² Takagi, A.³ Kamiya, T.⁴ Hirano, M.⁵ Hosono, H.⁶

8
- 36048988960
- 10.1002/pssr.200600049
- E. Fortunato, P. Barquinha, A. Pimentel, L. Pereira, G. Gonalves, and R. Martins, Phys. Stat. Sol., 1 (1), R34 (2007). 10.1002/pssr.200600049
- (2007) Phys. Stat. Sol. , vol.1 , Issue.1 , pp. 34
- Fortunato, E.¹ Barquinha, P.² Pimentel, A.³ Pereira, L.⁴ Gonalves, G.⁵ Martins, R.⁶

9
- 71149110092
- 10.1002/pssr.200903225
- W. S. Kim, Y. K. Moon, S. Lee, B. W. Kang, T. S. Kwon, K. T. Kim, and J. W. Park, Phys. Status Solidi RRL, 3 (7-8), 239 (2009). 10.1002/pssr.200903225
- (2009) Phys. Status Solidi RRL , vol.3 , Issue.78 , pp. 239
- Kim, W.S.¹ Moon, Y.K.² Lee, S.³ Kang, B.W.⁴ Kwon, T.S.⁵ Kim, K.T.⁶ Park, J.W.⁷

10
- 77958504777
- 10.1063/1.3505151
- J. S. Park, T. S. Kim, K. S. Son, E. Lee, K. H. Lee, W. L. Maeng, H. S. Kim, E. S. Kim, K. B. Park, J. Y. Kwon, M. K. Ryu, and S. Y. Lee, Appl. Phys. Lett., 97, 162105 (2010). 10.1063/1.3505151
- (2010) Appl. Phys. Lett. , vol.97 , pp. 162105
- Park, J.S.¹ Kim, T.S.² Son, K.S.³ Lee, E.⁴ Lee, K.H.⁵ Maeng, W.L.⁶ Kim, H.S.⁷ Kim, E.S.⁸ Park, K.B.⁹ Kwon, J.Y.¹⁰ Ryu, M.K.¹¹ Lee, S.Y.¹²

11
- 36449008182
- 10.1063/1.348716
- J. Kanicki, F. R. Libsch, J. Griffith, and R. Polastre, J. Appl. Phys., 69 (4), 2339 (1991). 10.1063/1.348716
- (1991) J. Appl. Phys. , vol.69 , Issue.4 , pp. 2339
- Kanicki, J.¹ Libsch, F.R.² Griffith, J.³ Polastre, R.⁴

12
- 33645607953
- 10.1063/1.351809
- S. Luan and G. W. Neudeck, J. Appl. Phys., 72 (2), 766 (1992). 10.1063/1.351809
- (1992) J. Appl. Phys. , vol.72 , Issue.2 , pp. 766
- Luan, S.¹ Neudeck, G.W.²

13
- 70450211254
- 10.1109/JDT.2009.2021490
- J. Jeong, Y. Hong, J. K. Jeong, J.-S. Park, and Y.-G. Mo, J. Display Technology, 5 (12), 495 (2009). 10.1109/JDT.2009.2021490
- (2009) J. Display Technology , vol.5 , Issue.12 , pp. 495
- Jeong, J.¹ Hong, Y.² Jeong, J.K.³ Park, J.-S.⁴ Mo, Y.-G.⁵

14
- 0032482038
- 10.1016/S0040-6090(97)01077-8
- S.-K. Rha, W.-J. Lee, S.-Y. Lee, Y.-S. Hwang, Y.-J. Lee, D.-I. Kim, D.-W. Kim, S.-S. Chun, and C.-O. Park, Thin Solid Films, 320, 134 (1998). 10.1016/S0040-6090(97)01077-8
- (1998) Thin Solid Films , vol.320 , pp. 134
- Rha, S.-K.¹ Lee, W.-J.² Lee, S.-Y.³ Hwang, Y.-S.⁴ Lee, Y.-J.⁵ Kim, D.-I.⁶ Kim, D.-W.⁷ Chun, S.-S.⁸ Park, C.-O.⁹

15
- 77649122278
- 10.1109/JDT.2009.2034559
- T. Kamiya, K. Nomura, and H. Hosono, J. Display Technol., 5 (12), 468 (2009). 10.1109/JDT.2009.2034559
- (2009) J. Display Technol. , vol.5 , Issue.12 , pp. 468
- Kamiya, T.¹ Nomura, K.² Hosono, H.³

16
- 0026137471
- (April). 10.1143/JJAP.30.703
- Y. Kanai, J. Appl. Phys., 30 (4), 703 (April 1991). 10.1143/JJAP.30.703
- (1991) J. Appl. Phys. , vol.30 , Issue.4 , pp. 703
- Kanai, Y.¹

17
- 34249697083
- 10.1063/1.2742790
- M. Kim, J. H. Jeong, H. J. Lee, T. K. Ahn, H. S. Shin, J. S. Park, J. K. Jeong, Y. G. MO, and H. D. Kim, Appl. Phys. Lett., 90, 21211 (2007). 10.1063/1.2742790
- (2007) Appl. Phys. Lett. , vol.90 , pp. 21211
- Kim, M.¹ Jeong, J.H.² Lee, H.J.³ Ahn, T.K.⁴ Shin, H.S.⁵ Park, J.S.⁶ Jeong, J.K.⁷ Mo, Y.G.⁸ Kim, H.D.⁹

18
- 59349115938
- 10.1149/1.3060129
- S. IL Kim, J. S. Park, C. J. Kim, J. C. Park, I. Song, and Y. S. Parka, J. Electrochemical Soc., 156 (3), H184 (2009). 10.1149/1.3060129
- (2009) J. Electrochemical Soc. , vol.156 , Issue.3 , pp. 184
- Kim, S.I.¹ Park, J.S.² Kim, C.J.³ Park, J.C.⁴ Song, I.⁵ Parka, Y.S.⁶

19
- 79953844973
- 10.1063/1.3570641
- S. Y. Lee, D. H. Kim, E. Chong, Y. W. Jeon, and D. H. Kim, Appl. Phys. Lett., 98, 122105 (2011). 10.1063/1.3570641
- (2011) Appl. Phys. Lett. , vol.98 , pp. 122105
- Lee, S.Y.¹ Kim, D.H.² Chong, E.³ Jeon, Y.W.⁴ Kim, D.H.⁵

20
- 84897690897
- 10.1557/PROC-336-823
- T. Globus, H. C. Slade, M. Shour, and M. Hack, Materials Research Society, Mat. Res. Soc. Symp. Proc., 336, (1994). 10.1557/PROC-336-823
- (1994) Materials Research Society, Mat. Res. Soc. Symp. Proc. , vol.336
- Globus, T.¹ Slade, H.C.² Shour, M.³ Hack, M.⁴

21
- 28044459237
- 10.1016/j.tsf.2005.08.268
- K. Ueda, H. Hiramatsu, T. Kamiya, and H. Hosono, Thin Solid Films, 496, 8 (2006). 10.1016/j.tsf.2005.08.268
- (2006) Thin Solid Films , vol.496 , pp. 8
- Ueda, K.¹ Hiramatsu, H.² Kamiya, T.³ Hosono, H.⁴

22
- 41649120938
- (Mar.). 10.1063/1.2857463
- H.-H. Hsieh, T. Kamiya, K. Nomura, H. Hosono, and C.-C. Wu, Appl. Phys. Lett., 92 (13), 133503 (Mar. 2008). 10.1063/1.2857463
- (2008) Appl. Phys. Lett. , vol.92 , Issue.13 , pp. 133503
- Hsieh, H.-H.¹ Kamiya, T.² Nomura, K.³ Hosono, H.⁴ Wu, C.-C.⁵

23
- 0343913988
- 10.1103/PhysRevLett.81.1243
- A. A. Istratov, C. Flink, H. Hieslmair, E. R. Weber, and T. Heiser, Phys. Rev. Lett., 81 (6), 1243 (1998). 10.1103/PhysRevLett.81.1243
- (1998) Phys. Rev. Lett. , vol.81 , Issue.6 , pp. 1243
- Istratov, A.A.¹ Flink, C.² Hieslmair, H.³ Weber, E.R.⁴ Heiser, T.⁵

24
- 36849132695
- 10.1063/1.1713322
- R. N. Hall and J. H. Racette, J. Appl. Phys., 35 (2), 379 (1964). 10.1063/1.1713322
- (1964) J. Appl. Phys. , vol.35 , Issue.2 , pp. 379
- Hall, R.N.¹ Racette, J.H.²

25
- 0020588118
- 10.1016/0038-1101(83)90159-4
- N. Toyama, Solid State Electronics, 26 (1), 37 (1983). 10.1016/0038-1101(83)90159-4
- (1983) Solid State Electronics , vol.26 , Issue.1 , pp. 37
- Toyama, N.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.