High conductivity gate metallurgy for TFT/LCD's

Materials Research Society Symposium - Proceedings

Volumn 508, Issue , 1998, Pages 37-46

  Fryer, Peter M ^a   Colgan, E ^a   Galligan, E ^a   Graham, W ^a   Horton, R ^a   Jenkins, L ^a   John, R ^a   Kuo, Y ^a   Latzko, K ^a   Libsch, F ^a   Lien, A ^a   Nywening, R ^a   Polastre, R ^a   Rothwell, M E ^a   Wilson, J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS SILICON; CONDUCTIVE MATERIALS; COPPER; LIQUID CRYSTAL DISPLAYS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

COPPER GATE METALLURGY;

THIN FILM TRANSISTORS;

EID: 0032308326     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-508-37     Document Type: Conference Paper

References (4)