Amorphous ZnO transparent thin-film transistors fabricated by fully lithographic and etching processes

Applied Physics Letters

Volumn 91, Issue 1, 2007, Pages

  Hsieh, Hsing Hung ^b   Wu, Chung Chih ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; HIGH FIELD-EFFECT MOBILITIES; ONOFF CURRENT RATIOS; OXIDE MIXTURES;

ETCHING; LITHOGRAPHY; OXIDES; SEMICONDUCTOR MATERIALS;

THIN FILM TRANSISTORS;

EID: 36048944461     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2753724     Document Type: Article

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