Global and local virtual metrology models for a plasma etch process

IEEE Transactions on Semiconductor Manufacturing

Volumn 25, Issue 1, 2012, Pages 94-103

  Lynn, Shane A ^a   Ringwood, John ^a   MacGearailt, Niall ^b  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b Intel Ireland Ltd   (Ireland)

Author keywords

Gaussian process regression; local modeling; neural network applications; plasma etch; virtual metrology (VM)

Indexed keywords

GAUSSIAN PROCESS REGRESSION; LOCAL MODELING; NEURAL NETWORK APPLICATIONS; PLASMA ETCH; VIRTUAL METROLOGY;

GAUSSIAN DISTRIBUTION; GAUSSIAN NOISE (ELECTRONIC); MEASUREMENTS; NEURAL NETWORKS; REGRESSION ANALYSIS; UNITS OF MEASUREMENT;

PLASMAS;

EID: 84858390246     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2176759     Document Type: Article

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