Weighted windowed PLS models for virtual metrology of an industrial plasma etch process

Proceedings of the IEEE International Conference on Industrial Technology

Volumn , Issue , 2010, Pages 309-314

  Lynn, Shane ^a   Ringwood, John V ^a   MacGearailt, Niall ^b  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

DATA SETS; ETCH RATES; GLOBAL MODELS; PARTIAL LEAST-SQUARES REGRESSION; PLASMA ETCH PROCESS; PLS MODELS; PROCESS SHIFTS; PROCESS VARIABLES; SAMPLE WEIGHTING; SEMICONDUCTOR MANUFACTURES; SLIDING-WINDOW; THROUGHPUT TIME; VIRTUAL METROLOGY;

COST REDUCTION; INDUSTRY; MATHEMATICAL MODELS;

MEASUREMENTS;

EID: 77954405242     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIT.2010.5472698     Document Type: Conference Paper

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