SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 75, Issue 4, 2004, Pages 397-404

Partial diagnostic data to plasma etch modeling using neural network

(2) Kim, Byungwhan a Kim, Sebum a

a Sejong University (South Korea)

Author keywords

Neural network; Optical emission spectroscopy; Plasma etching; Principal component analysis

Indexed keywords

BACKPROPAGATION; FILMS; MAGNETIC FIELDS; NEURAL NETWORKS; OXIDES; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRINCIPAL COMPONENT ANALYSIS; SPIN COATING;

ETCH RATES; OPTICAL EMISSION SPECTROSCOPY; PHOTORESIST PATTERNS; PLASMA CONTROL;

PLASMA ETCHING;

EID: 7544241898 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2004.07.070 Document Type: Article

Times cited : (12)

References (17)

1
- 0027592466
- C. Himmel, G.S. May, IEEE Trans. Semicond. Manufact. 6 (1993) 103.
- (1993) IEEE Trans. Semicond. Manufact. , vol.6 , pp. 103
- Himmel, C.¹ May, G.S.²

2
- 0035897276
- B. Kim, S. Park, Chemom. Intell. Lab. Syst. 56 (2001) 39.
- (2001) Chemom. Intell. Lab. Syst. , vol.56 , pp. 39
- Kim, B.¹ Park, S.²

3
- 0037248690
- B. Kim, K. Kwon, J. Appl. Phys. 93 (2003) 76.
- (2003) J. Appl. Phys. , vol.93 , pp. 76
- Kim, B.¹ Kwon, K.²

4
- 0036164586
- B. Kim, S. Kong, B.T. Lee, J. Vac. Sci. Technol. A 20 (2002) 146.
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 146
- Kim, B.¹ Kong, S.² Lee, B.T.³

5
- 0036827271
- B. Kim, J.H. Park, B.S. Kim, Comp. Chem. 26 (2002) 573.
- (2002) Comp. Chem. , vol.26 , pp. 573
- Kim, B.¹ Park, J.H.² Kim, B.S.³

6
- 0037470167
- B. Kim, S. Kim, Chemom. Intell. Lab. Syst. 65 (2003) 231.
- (2003) Chemom. Intell. Lab. Syst. , vol.65 , pp. 231
- Kim, B.¹ Kim, S.²

7
- 0033337701
- T.S. Kim, G.S. May, IEEE Trans. Semicond. Manufact. 22 (1999) 128.
- (1999) IEEE Trans. Semicond. Manufact. , vol.22 , pp. 128
- Kim, T.S.¹ May, G.S.²

8
- 0000296747
- R. W Chen, H. Huang, C.J. Spanos, M. Gatto, J. Vac. Sci. Technol. A 14 (1996) 1901.
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 1901
- Chen, R.W.¹ Huang, H.² Spanos, C.J.³ Gatto, M.⁴

9
- 0003658046
- Wiley, New York
- J.E. Jackson, A User's Guide to Principal Components, Wiley, New York, 1991.
- (1991) A User's Guide to Principal Components
- Jackson, J.E.¹

10
- 0003444646
- MIT Press, Cambridge
- D.E. Rummelhart, J.L. McClelland, Parallel Distributed Processing, MIT Press, Cambridge, 1986.
- (1986) Parallel Distributed Processing
- Rummelhart, D.E.¹ McClelland, J.L.²

11
- 0003486756
- Wiley, New York
- D.C. Mongomery, Design and Analysis of Experiments, Wiley, New York, 1991.
- (1991) Design and Analysis of Experiments
- Mongomery, D.C.¹

12
- 7544221915
- Applied materials
- Applied Materials, OES Reference Manual, 1998.
- (1998) OES Reference Manual

13
- 0031189218
- N.R. Rueger, J.J. Beulens, M. Schaepkens, M.F. Doemling, J.M. Mirza, T.E.F.M. Standaert, G.S. Oehriein, J. Vac. Sci. Technol. A 15 (1997) 1881.
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 1881
- Rueger, N.R.¹ Beulens, J.J.² Schaepkens, M.³ Doemling, M.F.⁴ Mirza, J.M.⁵ Standaert, T.E.F.M.⁶ Oehriein, G.S.⁷

14
- 0036026392
- B. Kim, K.H. Kwon, S.K. Kwon, J.M. Park, S.W. Yoo, K.S. Park, B.W. Kim, J. Vac. Sci. Technol. B 20 (2002) 2113.
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 2113
- Kim, B.¹ Kwon, K.H.² Kwon, S.K.³ Park, J.M.⁴ Yoo, S.W.⁵ Park, K.S.⁶ Kim, B.W.⁷

15
- 0041591272
- B. Kim, S.K. Kwon, Solid State Electron. 47 (2003) 1799.
- (2003) Solid State Electron. , vol.47 , pp. 1799
- Kim, B.¹ Kwon, S.K.²

16
- 0034272577
- M.J. Sowa, M.E. Littau, V. Pohray, J.L. Cecchi, J. Vac. Sci. Technol. A 18 (2000) 2122.
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2122
- Sowa, M.J.¹ Littau, M.E.² Pohray, V.³ Cecchi, J.L.⁴

17
- 0037463299
- B. Kim, K.H. Kwon, S.K. Kwon, J.M. Park, S.W. Yoo, K.S. Park, I.K. You, B.W. Kim, Thin Solid Film 426 (2003) 8.
- (2003) Thin Solid Film , vol.426 , pp. 8
- Kim, B.¹ Kwon, K.H.² Kwon, S.K.³ Park, J.M.⁴ Yoo, S.W.⁵ Park, K.S.⁶ You, I.K.⁷ Kim, B.W.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.